Quanti di scienza: time to fail

Il mio libro

L'universo dei numeri i numeri dell'Universo. Editrice Aracne

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Recensione sul blog scientifico Gravita' zero

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Recensione sul blog Amolamatematica

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Recensione sul blog Matematicamente

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Recensione sul blog MaddMaths

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Presentazione del libro - 9 Giugno 2012 Avezzano

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Intervista Antenna2 TG del 16 Giugno 2012

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Recensione su Stabiachannel.it

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Recensione sul Gazzettino Vesuviano

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Annuncio sul giornale Il Centro

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Dove acquistare il libro online

IBS

Amazon it

BOL

Ciao

Libreria Universitaria

Hoepli

Unilibro

Amazon.com

Pubblicazioni scientifiche

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Felice Russo et al., Investigation on capillaries filled with liquid scintillator for high resolution particle tracking, Nuclear Intruments and Methods in Physics Research, A30, 1991

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Felice Russo et al., Plasma Damage Correlation of Predatorâ Data with 0.5 um DRAM Device Scribe Structures, TI Technical Activity Report, 1998

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Felice Russo et al., Effect of HCl/HBr purity on polysilicon etching, Texas Inst. European Technical Conference, Nice, March 1995

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Felice Russo et al., High Planarization degree by Metal-Filled Interconnecting Grooves, TI Tecnhical Activity Report , March 1996

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Felice Russo, Plasma Etching Traning Course, Texas Instruments Internal communication, May 1995.

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Felice Russo, LDD process integration semplification for DRAM, TI Technical Activity Report, April 1995

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Felice Russo, Evolution of DRAM cell technology, TI Technical Activity Report, May 1998

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Felice Russo et al., Pipeline defects characterization and reduction, TI Technical Activity Report, Sept. 1997

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Felice Russo et al., Semiconductor Device Modeling using a Neural Network, TI Technical Journal, Jan-March 1999

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Felice Russo et al., Moat Etch Impact on Flash EPROM Technology, TI Technical Journal, Jan-March 1999.

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Felice Russo, Role of device scaling in yield modeling, Micron internal publication 2005

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Felice Russo, Fili di vetro per indagare gli atomi, Scienza & Vita, Dic. 1990

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Felice Russo, Radiazione di Sincrotrone, Scienza & Vita, Dic. 1989

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Felice Russo, Come le radiazioni aiutano il restauro, Scienza & Vita, Dic. 1989

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Felice Russo, La termoluminescenza, Scienza & Vita, Dic. 1988

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Felice Russo, Automi cellulari, List, Dic. 1988

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Felice Russo, On circular primes, Mathematical Spectrum letter to editor.

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Felice Russo and Fernanda Irrera, Off-stechiometric silicon oxides for applications in low-voltage flash memories, 11th Biennual Conference on Insulating films on semiconductors, 16-19 June 1999, Erlangen/Kloster Banz Germany.

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Felice Russo et al., Stress Induced VIA Voiding in a 130 nm CMOS Imager Process IEEE Transactions on Device and Materials Reliability, March 2010, V10, pag. 100-107

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Felice Russo et al, Prediction of breakdown in ultra-thin SiO2 films with fractal distribution of traps J. Appl. Phys. 2009, 106, 063768 (2009)

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Felice Russo et al., Low-k dielectrics for trench isolation in nanoscaled CMOS imagers Journal of Vacuum Science Technology B, 27 (1) (2009), 517-20

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Felice Russo et al., STI with air-gaps in nanoscaled CMOS imagers Workshop on Dielectrics in Microelectronics (WODIM), Berlino, 2008

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Felice Russo et al., T-shaped shallow trench isolation with an unfilled floating void Solid-State Electronics 52 (2008), 1188-1192

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Felice Russo and Fernanda Irrera, Off-stochiometric
silicon oxides for applications in low-voltage flash memories Microelectronic Engineering, 48 (1999) 423

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Felice Russo and Fernanda Irrera, Silicon rich oxides in the gate stack of non-volatile memories Proc. of INFOS Erlangen (D) 1999

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Felice Russo and Fernanda Irrera, Enhanced injection in n++-poly/SiOx/SiO2/p-sub MOS capacitors for low-voltage non-volatile memory applications: experiment IEEE-Trans. Electron Devices 46 (1999) 2315

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Felice Russo, L’universo dei numeri I numeri dell’universo, Editore Aracne, 2011, pag. 508

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Felice Russo, A set of new Smarandache functions, sequences and conjectures in number theory, American Research Press, Lupton USA, 2000

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Felice Russo and Paolo Organtini, Forecast of CMOS imagers yield learning by the Gompertz model, IEEE Transaction on semicondcutor manufacturing, Vol. 26, Issue 3 Aug. 2013. Already published on Micron Technical Journal Vol. 3 No. 2 Aug. 2012

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Felice Russo et al, Proximity Gettering of Slow Diffuser Contaminants in CMOS Image Sensors, Micron Technical Journal Aug2013

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Felice Russo et al., Proximity Gettering of Slow Diffuser Contaminants in CMOS Image Sensors, Proceedings of GADEST 2013, Solid State Phenomena 2013

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Felice Russo et al, Proximity Gettering of Slow Diffuser Contaminants in CMOS Image Sensors, Solid State Electronics 91 (2014) 91-99

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Felice Russo, The Smarandache P and S persistence of a prime, Scientia Magna Vol.1 (2006) No. 2, 71-75

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Felice Russo and Stefano Russo, A Pattern Recognition Tool for Automatic Etch Process Quality Check, Advanced Semiconductor Manufacturing Conference
, 2008 ASMC IEEE/SEMI